Example of VA / VE proposals

CERAMICS DESIGN LAB > Suggestions for integration of suction End Effector / Handling Arm cavities

Suggestions for integration of suction End Effector / Handling Arm cavities

  • Problems
    Productivity (Throughput)
    Product Life
    Cost
  • Proposed Effect
    Improved Heat Resistance
    Man-Hour Reduction
    Long Service Life
    Cost Reduction
    Outgassing Reduction
  • Product Type
    Wafer Transfer End Effector / Handling Arm

Customer's concerns and problems / Before

Customers who used to use suction End Effector / Handling Arm with SUS bonding specifications consulted about the need for frequent replacement due to SUS peeling during use.

  • Suggestions for integration of suction End Effector / Handling Arm cavities|Ceramics Design Lab

Our proposals and improvement effects / After

We made a proposal for ceramics using Asuzac’s cavity-integrated technology.


Using the integrated cavity technology, it is possible to remanufacture a large, high-strength but very light suction End Effector / Handling Arm.


The suction End Effector / Handling Arm used to be replaced once a year in SUS steel, but after the change to ceramics, the frequency of replacement became once a few years, resulting in cost reductions, reduced replacement time and productivity UP.

  • Suggestions for integration of suction End Effector / Handling Arm cavities|Ceramics Design Lab

Point of the proposed example / Point

The point of this case is that the service life has been extended more than twice as long by using ceramics from metal materials.


By taking advantage of the light weight, high rigidity, and high strength that are characteristics of ceramics, it is possible to achieve excellent effects.


The Fine Ceramics Division of ASUZAC Corporation, which operates the Ceramics Design Laboratory, handles everything from material development and preparation to design and manufacture, as well as surface treatment, inspection, and cleaning.


We can also offer our own coating-technology for adding functionality to ceramics materials, as well as the selection of materials such as ceramics materials with high heat resistance and conductivity, and high-purity alumina and SiC that are highly pure and prevent contamination.


If you have trouble with the existing suction hand, please feel free to contact us.

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Examples of VA/VE proposals
for designers and developers

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  • Deformation
  • Cost
  • Particles
  • Conductivity
  • Suction Marks
  • Static Electricity
  • 大型偏光フィルムの吸着
  • Warped Wafer
  • Productivity (Throughput)
  • Impurities
  • Sparking
  • Wafer Scratching
  • Part Replacement Time
  • Outgassing
  • Surface Resistance
  • Wafer Sticking
  • Reflectance
  • Air-Permeability
  • Lint adhesion
  • Misalignment
  • Clogging
  • Plasma Resistance
  • Yield
  • Contact Damage
  • Product Life
  • Dust Emissions
  • Defect Rate
  • Heat Resistance
  • Contamination
  • Abrasion
  • Functionality
  • Chemical Resistance
  • Corrosion Resistance
  • 薄ウェハ

Part Replacement Time

薄ウェハ

  • 準備中です
  • Metal Contamination Control
  • Wear Resistance Improvement
  • Improved Functionality
  • Wafer Scratch Prevention
  • Anti-Static Measures
  • Improved Heat Resistance
  • Portability
  • Warped Wafer Prevention
  • Sparking Prevention
  • Improved Chemical Resistance
  • Improved Productivity
  • Misalignment Prevention
  • Reduced Defect Rate
  • Improved Productivity(Improved Throughput)
  • Wear Resistance
  • Contact Damage Reduction
  • Yield Improvement
  • Man-Hour Reduction
  • Surface Resistance Control
  • Wear Prevention
  • Particle Control
  • Suction Mark Reduction
  • Outgassing Reduction
  • Deformation Reduction
  • Improved Plasma Resistance
  • Long Service Life
  • ワークの傷防止
  • Contamination Measures
  • Cost Reduction

Improved Functionality

Improved Productivity(Improved Throughput)

Man-Hour Reduction

Cost Reduction

  • Wafer Transfer End Effector / Handling Arm
  • Baking Setter
  • Porous Chuck
  • Alumina Cover
  • PAD
  • Other

Wafer Transfer End Effector / Handling Arm

CONTACT

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